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Non-convex profile evolution in two dimensions using volume of fluids

Technical Report ·
DOI:https://doi.org/10.2172/539515· OSTI ID:539515
;  [1];  [2]
  1. Lawrence Berkeley National Lab., CA (United States)
  2. Univ. of California, Davis, CA (United States). Dept. of Mathematics
A new Volume of Fluid (VoF) method is applied to the problem of surface evolution in two dimensions (2D). The VoF technique is applied to problems that are representative of those that arise in semiconductor manufacturing, specifically photolithography and ion-milling. The types of surface motion considered are those whose etch rates vary as a function of both surface position and orientation. Functionality is demonstrated for etch rates that are non-convex in regard to surface orientation. A new method of computing surface curvature using divided differences of the volume fractions is also introduced, and applied to the advancement of surfaces as a vanishing diffusive term.
Research Organization:
Lawrence Berkeley Lab., CA (United States)
Sponsoring Organization:
USDOE Office of Energy Research, Washington, DC (United States)
DOE Contract Number:
AC03-76SF00098
OSTI ID:
539515
Report Number(s):
LBNL--40693; ON: DE98000157
Country of Publication:
United States
Language:
English