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Impression creep behavior of atmospheric plasma sprayed and hot pressed MoSi{sub 2}/Si{sub 3}N{sub 4}

Conference ·
OSTI ID:538063
The use of MoSi{sub 2} as a high temperature oxidation resistant structural material is hindered by its poor elevated temperature creep resistance. The addition of second phase Si{sub 3}N{sub 4} holds promise for improving the creep properties of MoSi{sub 2} without decreasing oxidation resistance. The high temperature impression creep behavior of atmospheric plasma sprayed (APS) and hot pressed (HP) MoSi{sub 2}/Si{sub 3}N{sub 4} composites was investigated. Values for steady state creep rates, creep activation energies, and creep stress exponents were measured. Grain boundary sliding and splat sliding were found to be the dominant creep mechanisms for the APS samples while grain boundary sliding and plastic deformation were found to be the dominant creep mechanisms for the HP samples.
Research Organization:
Los Alamos National Lab., NM (United States)
Sponsoring Organization:
USDOE Assistant Secretary for Energy Efficiency and Renewable Energy, Washington, DC (United States)
DOE Contract Number:
W-7405-ENG-36
OSTI ID:
538063
Report Number(s):
LA-UR--97-1666; CONF-970929--; ON: DE97008889
Country of Publication:
United States
Language:
English

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