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Experimental determination of the upper critical field of epitaxially grown thin films of YBa sub 2 Cu sub 3 O sub 7 minus. delta. down to He temperature

Journal Article · · Journal of Applied Physics; (United States)
DOI:https://doi.org/10.1063/1.349435· OSTI ID:5329194
; ;  [1];  [2]
  1. Institute of Thin Film and Ion Technology, Forschungszentrum Juelich, P.O. Box 1913, D-5170 Juelich (Federal Republic of Germany)
  2. Service National des Champs Intenses, CNRS, BP 166X, 38042 Grenoble (France)
The upper critical field of YBa{sub 2}(Cu{sub 1{minus}{ital x}}Fe{sub {ital x}}){sub 3}O{sub 7{minus}{delta}} with {ital x}=0 and 0.05 is determined over the whole temperature range from 4.2 K to {ital T}{sub {ital c}}. The data behave according to the theory of Werthamer, Helfand, and Hohenberg (N. R. Werthamer, E. Helfand, and P. C. Hohenberg, Phys. Rev. {bold 147}, 295 (1966)). However, at low temperatures the upper critical field is larger than expected from the original expressions of Werthamer and co-workers. Generalized equations, which take into account the anisotropy of the Fermi surface, yield values for the upper critical field, which are in excellent agreement with the experimental data.
OSTI ID:
5329194
Journal Information:
Journal of Applied Physics; (United States), Journal Name: Journal of Applied Physics; (United States) Vol. 70:4; ISSN 0021-8979; ISSN JAPIA
Country of Publication:
United States
Language:
English