Ultra-precision grinding of chemically vapor deposited silicon carbide mirrors for synchrotron radiation

Book · Tue Dec 31 04:00:00 EST 1996

OSTI ID:531536

Namba, Yoshiharu ^[1]

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1. Chubu Univ., Kasugai, Aichi (Japan). Dept. of Mechanical Engineering

Chemically vapor deposited silicon carbide (CVD-SiC) is the most important material of mirrors for high-brightness synchrotron radiation beamlines, though the material is too difficult to be machined. It takes quite a long time to polish SiC substrate to make mirrors. This paper intends to reduce the machining time to make CVD-SiC mirrors by using ultra-precision grinding technology. The CVD-SiC sample has been ground into 0.4nm rms in surface roughness by a resinoid-bonded diamond wheel and an ultra-precision surface grinder having a glass-ceramic spindle of extremely-low thermal expansion. The surface roughness of ground samples were measured with TOPO-3D and AFM. 88.7% reflectivity has been obtained on the ground CVD-SiC flat surface, measured with X-ray of 0.834 nm in wavelength at the grazing incident angle of 0.7--0.95 degree. The reflectivity depends upon the angle between the direction of incident beam and grinding marks on the sample. The relationship between the surface roughness and grinding conditions was also discussed.

• OSTI ID: 531536
• Report Number(s): CONF-960848--; ISBN 0-8194-2244-4
• Country of Publication: United States
• Language: English

Related Subjects

43 PARTICLE ACCELERATORS
ACCELERATOR FACILITIES
EXPERIMENTAL DATA
GRINDING
GRINDING MACHINES
MIRRORS
SILICON CARBIDES
SURFACE PROPERTIES
SYNCHROTRON RADIATION SOURCES