Depth of origin of sputtered atoms

Conference · Thu Jan 01 04:00:00 EST 1987

OSTI ID:5312461

Jorgensen, B; Pellin, M J; Young, C E; Calaway, W F; Schweitzer, E L; Gruen, D M; Burnett, J W; Yates, J T

The depth of origin of sputtered atoms is an important quantity in surface physics. The importance is best observed by examining the literature on computer simulations and theoretical calculations. It is hard to find experimental measurements of the depth of origin of sputtered atoms, which is probably due to the difficulty of such experiments. A good determination of the depth of origin should be done on a well characterized system and without damaging it. The results reported here are obtained from 1-2 monolayers of Cu on a Ru(0001) single crystal surface. The first 2 monolayers of Cu evaporated onto Ru(0001) is known to exhibit a layer by layer growth. The sputtering is studied in the Surface Analysis by Resonance Ionization of Sputtered Atoms(SARISA) apparatus, where it is possible to do the determination before the overlayer is damaged by the ion beam. One monolayer of Cu on Ru is found to give a ratio of 3.2 between Cu and Ru in the sputtered flux for 4 keV normal incidence Ar ions. 3 refs., 2 figs., 1 tab.

• Research Organization: Argonne National Lab., IL (USA); Pittsburgh Univ., PA (USA). Surface Science Center
• DOE Contract Number: W-31109-ENG-38
• OSTI ID: 5312461
• Report Number(s): CONF-8708129-2; ON: DE88005929
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360102* -- Metals & Alloys-- Structure & Phase Studies
656003 -- Condensed Matter Physics-- Interactions between Beams & Condensed Matter-- (1987-)
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ADSORPTION
ARGON IONS
ATOMS
AUGER ELECTRON SPECTROSCOPY
CHARGED PARTICLES
COPPER
CRYSTALS
DEPTH
DIMENSIONS
ELECTRON SPECTROSCOPY
ELEMENTS
IONS
LAYERS
METALS
MONOCRYSTALS
ORIGIN
PLATINUM METALS
RUTHENIUM
SORPTION
SPECTROSCOPY
SPUTTERING
SURFACE PROPERTIES
TRANSITION ELEMENTS