Proton stitching of layers of SiO sub 2 particles to fused silica

Journal Article · Wed Nov 15 04:00:00 EST 1989 · Journal of Applied Physics; (USA)

DOI:https://doi.org/10.1063/1.343746· OSTI ID:5298818

Musket, R G; Thomas, I M ^[1]

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1. Lawrence Livermore National Laboratory, Livermore, California 94550 (US)

Irradiation with 100-keV protons to doses of 2.3{times}10{sup 15}--7.6{times}10{sup 16} H/cm{sup 2} enhanced the adhesion and abrasion resistance of 220-nm-thick antireflective, optical coatings on fused silica substrates without adversely affecting the optical transmission and laser-damage threshold for 1064-nm photons. The as-deposited, sol-gel coatings consisted of porous layers of uniform, spherical silica particles having diameters of either 8 or 20 nm. The proton doses required for significant improvements in adhesion and abrasion resistance increased with particle diameter and decreased slightly for coatings precleaned by exposure to ultraviolet radiation in the presence of reactive gases.

• OSTI ID: 5298818
• Journal Information: Journal of Applied Physics; (USA), Journal Name: Journal of Applied Physics; (USA) Vol. 66:10; ISSN 0021-8979; ISSN JAPIA
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360605* -- Materials-- Radiation Effects
ABRASION
ADHESION
ANTIREFLECTION COATINGS
BEAMS
CHALCOGENIDES
COATINGS
ENERGY RANGE
KEV RANGE
KEV RANGE 10-100
LAYERS
MINERALS
NUCLEON BEAMS
OXIDE MINERALS
OXIDES
OXYGEN COMPOUNDS
PARTICLE BEAMS
PHYSICAL RADIATION EFFECTS
PROTON BEAMS
RADIATION EFFECTS
SILICA
SILICON COMPOUNDS
SILICON OXIDES
SUBSTRATES