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Effective dissociation cross section for the low-energy (0. 5-31 eV) electron impact on solid n-hexane thin films

Journal Article · · J. Phys. Chem.; (United States)
DOI:https://doi.org/10.1021/j100310a008· OSTI ID:5285729
The authors describe a low-energy electron impact experiment, performed on thin n-hexane films held at 80 K, that was designed for the measurement of the effective dissociation cross section in the energy range 0.5-31 eV. The onset of dissociation was found at approx. 3.6 eV incident electron energy, implicating the excitation of a low-lying triplet state. High dissociation rates at electron energies close to the ionization threshold were correlated to dissociative excited singlet and superexcited states.
Research Organization:
Universite de Sherbrooke, Quebec (Canada)
OSTI ID:
5285729
Journal Information:
J. Phys. Chem.; (United States), Journal Name: J. Phys. Chem.; (United States) Vol. 91:26; ISSN JPCHA
Country of Publication:
United States
Language:
English