Silane purification via laser-induced chemistry

Journal Article · Sun Jan 01 04:00:00 EST 1978 · Appl. Phys. Lett.; (United States)

DOI:https://doi.org/10.1063/1.89835· OSTI ID:5269183

Clark, J H; Anderson, R G

PH/sub 3/, AsH/sub 3/, and B/sub 2/H/sub 6/ have been removed from SiH/sub 4/ by means of selective photolysis with an ArF uv laser. The absolute absorption cross sections for SiH/sub 4/, PH/sub 3/, AsH/sub 3/, and B/sub 2/H/sub 6/ have been determined over the region 190--200 nm. Quantum yields for destruction of the contaminant species have been measured at 193 nm. The effects of free-radical reactions subsequent to photolysis on the selectivity of removal of PH/sub 3/, AsH/sub 3/, and B/sub 2/H/sub 6/ were found to be minimal. These results suggest that the purification of SiH/sub 4/ via a laser-induced chemical process may be of considerable practical importance.

• Research Organization: University of California, Los Alamos Scientific Laboratory, Los Alamos, New Mexico 87545
• OSTI ID: 5269183
• Journal Information: Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 32:1; ISSN APPLA
• Country of Publication: United States
• Language: English

Related Subjects

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
400102* -- Chemical & Spectral Procedures
ABSORPTION
ARGON COMPOUNDS
ARGON FLUORIDES
ARSENIC COMPOUNDS
ARSENIC HYDRIDES
BORANES
BORON COMPOUNDS
CHEMICAL REACTIONS
CROSS SECTIONS
DECOMPOSITION
DISSOCIATION
ELECTROMAGNETIC RADIATION
FLUORIDES
FLUORINE COMPOUNDS
GAS LASERS
HALIDES
HALOGEN COMPOUNDS
HYDRIDES
HYDROGEN COMPOUNDS
IMPURITIES
LASERS
PHOSPHINES
PHOSPHORUS COMPOUNDS
PHOTOCHEMICAL REACTIONS
PHOTOLYSIS
PURIFICATION
RADIATIONS
RARE GAS COMPOUNDS
SEPARATION PROCESSES
SILANES
SILICON COMPOUNDS
TRACE AMOUNTS
ULTRAVIOLET RADIATION