Enhancement of the plasma potential by fluctuating electric fields near the ion cyclotron frequency

Journal Article · Mon Aug 26 04:00:00 EDT 1985 · Phys. Rev. Lett.; (United States)

DOI:https://doi.org/10.1103/PhysRevLett.55.947· OSTI ID:5259441

Hershkowitz, N; Nelson, B A; Johnson, J; Ferron, J R; Persing, H; Chan, C; Golovato, S N; Callen, J D; Woo, J

It is found that ion cyclotron rf can create an ion plugging plasma potential equal to several times T/sub e//e(approx. =T/sub i//e) in the Phaedrus tandem mirror end cells or at the end of the central cell. A model based on a local balance of electron expulsion by the rf field E/sub z/ and trapping by Coulomb scattering predicts the magnitude and scaling of the potential with density and rf antenna current. This model is in reasonable agreement with experimental observations. This ion-cyclotron rf enhanced potential increases as the plasma density decreases and as the antenna current increases.

• Research Organization: Nuclear Engineering Department, University of Wisconsin, Madison, Wisconsin 53706
• DOE Contract Number: AC02-78ET51015
• OSTI ID: 5259441
• Journal Information: Phys. Rev. Lett.; (United States), Journal Name: Phys. Rev. Lett.; (United States) Vol. 55:9; ISSN PRLTA
• Country of Publication: United States
• Language: English

Related Subjects

70 PLASMA PHYSICS AND FUSION TECHNOLOGY
700101* -- Fusion Energy-- Plasma Research-- Confinement
Heating
& Production
ANTENNAS
AUGMENTATION
CONFINEMENT
COULOMB FIELD
CYCLOTRON FREQUENCY
DATA
ELECTRIC FIELDS
ELECTRICAL EQUIPMENT
EQUIPMENT
FLUCTUATIONS
HEATING
HIGH-FREQUENCY HEATING
ICR HEATING
INFORMATION
MAGNETIC MIRRORS
NUMERICAL DATA
OPEN PLASMA DEVICES
PLASMA
PLASMA CONFINEMENT
PLASMA DENSITY
PLASMA HEATING
POTENTIALS
SCALING LAWS
SCATTERING
TANDEM MIRRORS
THEORETICAL DATA
THERMONUCLEAR DEVICES
TRAPS
VARIATIONS