Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Formation of negative hydrogen ions on a cesiated W(110) surface; the influence of hydrogen implantation

Journal Article · · J. Appl. Phys.; (United States)
DOI:https://doi.org/10.1063/1.335732· OSTI ID:5257695
The negative hydrogen ion formation process on a cesiated W(110) surface is studied by scattering a proton beam from such a surface. The primary energy ranges from 50 to 3000 eV. The angle of incidence with respect to the surface normal is 45/sup 0/ or 70/sup 0/. A maximum negative-ion formation probability of 0.67 is measured. This quantity does not depend on the angle of incidence. However, it is strongly influenced by the time the surface has been exposed to the beam. This effect is attributed to hydrogen implantation.
Research Organization:
Association EURATOM-FOM, FOM-Institute for Atomic and Molecular Physics, Kruislaan 407, 1098 SJ Amsterdam, The Netherlands
OSTI ID:
5257695
Journal Information:
J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 58:9; ISSN JAPIA
Country of Publication:
United States
Language:
English