Target presputtering effects on stoichiometry and deposition rate of Y-Ba-Cu-O thin films grown by dc magnetron sputtering
Y-Ba-Cu-O thin films have been grown from stoichiometric compound targets using dc magnetron sputtering. Initially, the film composition was strongly off-stoichiometric and the deposition rate very low. However, after extensive presputtering, stoichiometric films, with respect to the metal content, were deposited at a rate of 2--2.5 A/s. The long presputtering time (20--30 h) needed is due to a slowly changing oxygen content on the target surface. This is caused not only by preferential sputtering effects, but also by bulk diffusion in the target. The presputtering time is significantly decreased if the target is annealed in an argon atmosphere prior to use. Oxygen adsorbed on the target surface during venting of the chamber will also affect the process significantly.
- Research Organization:
- Thin Film Group, Department of Physics, Linkoeping University, S-581 83 Linkoeping, Sweden
- OSTI ID:
- 5256107
- Journal Information:
- Appl. Phys. Lett.; (United States), Vol. 52:22
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
BARIUM OXIDES
CHEMICAL COMPOSITION
SPUTTERING
STOICHIOMETRY
COPPER OXIDES
SUPERCONDUCTING FILMS
FABRICATION
YTTRIUM OXIDES
ADSORPTION
CRYSTAL STRUCTURE
EXPERIMENTAL DATA
MAGNETRONS
SORPTIVE PROPERTIES
SURFACE COATING
VAPOR DEPOSITED COATINGS
ALKALINE EARTH METAL COMPOUNDS
BARIUM COMPOUNDS
CHALCOGENIDES
COATINGS
COPPER COMPOUNDS
DATA
DEPOSITION
ELECTRON TUBES
ELECTRONIC EQUIPMENT
EQUIPMENT
FILMS
INFORMATION
MICROWAVE EQUIPMENT
MICROWAVE TUBES
NUMERICAL DATA
OXIDES
OXYGEN COMPOUNDS
SORPTION
SURFACE PROPERTIES
TRANSITION ELEMENT COMPOUNDS
YTTRIUM COMPOUNDS
360201* - Ceramics
Cermets
& Refractories- Preparation & Fabrication
360202 - Ceramics
Cermets
& Refractories- Structure & Phase Studies
360204 - Ceramics
Cermets
& Refractories- Physical Properties