Chemical vapor deposition of copper and copper oxide thin films from copper(I) tert-butoxide

Journal Article · Wed Feb 01 04:00:00 EST 1989 · Chemistry of Materials; (USA)

DOI:https://doi.org/10.1021/cm00001a004· OSTI ID:5251463

Jeffries, P M; Girolami, G S ^[1]

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1. Univ. of Illinois, Urbana-Champaign (USA)

The low-temperature deposition of thin-film materials from molecular transition-metal precursors is an area of rapidly growing interest. We now describe the deposition of copper-containing films from copper(I) tert-butoxide tetramer, (Cu(O-t-Bu)){sub 4}, which was chosen because it is one of the more volatile molecular derivatives of copper known. These results are related to efforts directed toward the chemical vapor deposition of thin films of the new copper oxide based high-temperature superconductors.

• DOE Contract Number: AC02-76ER01198
• OSTI ID: 5251463
• Journal Information: Chemistry of Materials; (USA), Journal Name: Chemistry of Materials; (USA) Vol. 1:1; ISSN CMATE; ISSN 0897-4756
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360101* -- Metals & Alloys-- Preparation & Fabrication
360104 -- Metals & Alloys-- Physical Properties
360201 -- Ceramics
Cermets
& Refractories-- Preparation & Fabrication
360204 -- Ceramics
Cermets
& Refractories-- Physical Properties
ALKOXIDES
CHALCOGENIDES
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
COATINGS
COPPER
COPPER COMPOUNDS
COPPER OXIDES
DATA
DEPOSITION
ELECTRIC CONDUCTIVITY
ELECTRICAL PROPERTIES
ELECTRON MICROSCOPY
ELEMENTS
EXPERIMENTAL DATA
FILMS
INFORMATION
METALS
MICROSCOPY
NUMERICAL DATA
OXIDES
OXYGEN COMPOUNDS
PHYSICAL PROPERTIES
SCANNING ELECTRON MICROSCOPY
SUPERCONDUCTIVITY
SURFACE COATING
THIN FILMS
TRANSITION ELEMENT COMPOUNDS
TRANSITION ELEMENTS
VAPOR DEPOSITED COATINGS