skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Field effect in an n-GaAs metal-anodic oxide-film injunction

Journal Article · · Sov. Phys. J. (Engl. Transl.); (United States)
OSTI ID:5250356

In this paper the authors present results attained in parallel investigations of mobility ..mu../sub F/ in the field effect, capacitance C, and the active conductance component G for a wide range of frequencies and controlling voltages, as well as of the capacitor saturation photoelectron-motive force phi/sub sat/(V) in an n-GaAs metal-AO-epitaxial film structure. A new combined method is offered for the determination of separation-boundary parameters, based on an analysis of the relationships between ..mu../sub F/, C, and G and the controlling voltage and the test frequency

Research Organization:
Lobachevskii State Univ., Gorkii (USSR)
OSTI ID:
5250356
Journal Information:
Sov. Phys. J. (Engl. Transl.); (United States), Vol. 29:4; Other Information: Translated from Izv. Vyssh. Uchebn. Zaved., Fiz.; 29: No. 4, 61-66(Apr 1986)
Country of Publication:
United States
Language:
English

Similar Records

Si{sub 3}N{sub 4} on GaAs by direct electron cyclotron resonance plasma assisted nitridation of Si layer in Si/GaAs structure
Journal Article · Sun Mar 01 00:00:00 EST 1998 · Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena · OSTI ID:5250356

Electrical characteristics of Si sub 3 N sub 4 /Si/GaAs metal-insulator-semiconductor capacitor
Journal Article · Mon Nov 25 00:00:00 EST 1991 · Applied Physics Letters; (United States) · OSTI ID:5250356

Interface characterization of Si{sub 3}N{sub 4}/Si/GaAs heterostructures after high temperature annealing
Journal Article · Sun Nov 01 00:00:00 EST 1998 · Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena · OSTI ID:5250356