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Title: Paramagnetic point defects in amorphous silicon dioxide and amorphous silicon nitride thin films

Journal Article · · Journal of the Electrochemical Society; (United States)
DOI:https://doi.org/10.1149/1.2069319· OSTI ID:5236388
 [1];  [2]; ;  [3]
  1. Electronic Ceramics Div., Sandia National Lab., Albuquerque, NM (US)
  2. IBM Research Div., Thomas J. Watson Research Center, Yorktown Heights, NY (US)
  3. U.S. Army Electronics Technology and Devices Lab., Fort Monmouth, NJ (US)

In this paper the authors review paramagnetic point defects in amorphous silicon nitride thin films. We will discuss two intrinsic paramagnetic defects: a trivalent silicon center, named the K-center, and the recently observed nitrogen dangling-bond center. We examine the structural identification, and the electronic properties of the K-center, as well as consider why a SiN{sub x}:H is generally a very effective charge trapping dielectric. In addition, this paper compares and contrasts special features of the structure and electronic role of the paramagnetic point defects in both silicon dioxide and silicon nitride thin films; this may provide insight for further studies on the physics and chemistry of these dangling-bond centers in both materials.

DOE Contract Number:
AC04-76DP00789
OSTI ID:
5236388
Journal Information:
Journal of the Electrochemical Society; (United States), Vol. 139:3; ISSN 0013-4651
Country of Publication:
United States
Language:
English