Influence of substrate topography on the nucleation of diamond thin films

Journal Article · Mon Sep 23 00:00:00 EDT 1991 · Applied Physics Letters; (United States)

DOI:https://doi.org/10.1063/1.106283· OSTI ID:5235472

Dennig, P A; Stevenson, D A ^[1]

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1. Stanford University, Department of Materials Science and Engineering, Building 550, Stanford, California (USA)

We have investigated the effect of substrate topography on nucleation behavior by producing a variety of substrate features on molybdenum and silicon substrates. The initial stages of nucleation on these substrates were studied by exposing them to similar conditions in a hot filament chemical vapor deposition reactor. For these materials, nucleation is favored on prominent features of the substrate; that is, features that protrude with sharp edges or apexes, as opposed to sharp valleys or flat regions. Several possible explanations are given for this behavior.

• OSTI ID: 5235472
• Journal Information: Applied Physics Letters; (United States), Journal Name: Applied Physics Letters; (United States) Vol. 59:13; ISSN APPLA; ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360602* -- Other Materials-- Structure & Phase Studies
656002 -- Condensed Matter Physics-- General Techniques in Condensed Matter-- (1987-)
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
CARBON
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
DEPOSITION
DIAMONDS
ELEMENTAL MINERALS
ELEMENTS
MINERALS
NONMETALS
NUCLEATION
SUBSTRATES
SURFACE COATING
TOPOGRAPHY