Synthesis of nanocomposite thin film Ti/Al multilayers and Ti-aluminides

Conference · Mon Sep 01 04:00:00 EDT 1997

OSTI ID:522321

Banerjee, R; Zhang, X D; Dregia, S A; Fraser, H L ^[1]

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1. Ohio State Univ., Columbus, OH (United States). Dept. of Materials Science and Engineering

Nanocomposite Ti/Al multilayered thin films have been deposited by magnetron sputtering. These multilayers exhibit interesting structural transitions on reducing the layer thickness of both Ti and Al. Ti transforms from its bulk stable hcp structure to fcc and Al transforms from fcc to hcp. The effect of ratio of Ti layer thickness to Al layer thickness on the structural transitions has been investigated for a constant bilayer periodicity of 10 nm by considering three different multilayers: 7.5 nm Ti/2.5 nm Al, 5 nm Ti/5 nm Al and 2.5 nm Ti/7.5 nm Al. The experimental results have been qualitatively explained on the basis of a thermodynamic model. Preliminary experimental results of interfacial reactions in Ti/Al bilayers resulting in the formation of Ti-aluminides are also presented in this paper.

• OSTI ID: 522321
• Report Number(s): CONF-961202--; ISBN 1-55899-361-4
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ALUMINIUM
ANNEALING
COMPOSITE MATERIALS
CRYSTAL-PHASE TRANSFORMATIONS
INTERFACES
INTERMETALLIC COMPOUNDS
LAYERS
SPUTTERING
SYNTHESIS
THERMODYNAMIC MODEL
THIN FILMS
TITANIUM