Synthesis and characterization of small grain sized molybdenum nitride films

Book · Mon Sep 01 04:00:00 EDT 1997

OSTI ID:522304

Roberson, S L; Davis, R F ^[1]; Finello, D ^[2]

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1. North Carolina State Univ., Raleigh, NC (United States)
2. Wright Lab., Eglin AFB, FL (United States)

Polycrystalline, small grain sized, 15 {micro}m thick Mo{sub x}N (x = 1 or 2) films, void of detectable concentrations of molybdenum oxides, have been prepared on 50 {micro}m thick nitrided Ti substrates via conversion of precursor MoO{sub 3} films in a programmed reaction with NH{sub 3}. The latter films were produced via liquid spray pyrolysis of an MoCl{sub 5}/methanol mixture in air at 500 C. The reaction of MoO{sub 3} films with NH{sub 3} resulted in a two-phase Mo{sub x}N mixture consisting of {gamma}-Mo{sub 2}N and {delta}-MoN ({rho} = 9.05 g/cm{sup 3}) produced grains with a calculated average size of 10 nm without losing adherence to the substrate. The composition of the Mo{sub x}N films was determined by X-ray diffraction (XRD) and Auger electron spectroscopy (AES) to be {approx} 60% {gamma}-Mo{sub 2}N and 40% {delta}-MoN. The results of scanning electron microscopy (SEM) showed the surface morphology of the Mo{sub x}N films to be highly porous.

• OSTI ID: 522304
• Report Number(s): CONF-961202--; ISBN 1-55899-361-4
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
AMMONIA
EXPERIMENTAL DATA
GRAIN SIZE
MICROSTRUCTURE
MOLYBDENUM CHLORIDES
MOLYBDENUM NITRIDES
NITRIDATION
OXIDATION
SUBSTRATES
SYNTHESIS
THIN FILMS
TITANIUM