Uv laser triggering of high-voltage gas switches

Journal Article · Thu Jul 01 00:00:00 EDT 1982 · J. Appl. Phys.; (United States)

DOI:https://doi.org/10.1063/1.331301· OSTI ID:5222242

Woodworth, J R; Frost, C A; Green, T A

Two different techniques are discussed for uv laser triggering of high-voltage gas switches using a KrF laser (248 nm) to create an ionized channel through the dielectric gas in a spark gap. One technique uses an uv laser to induce breakdown in SF/sub 6/. For this technique, we present data that demonstrate a 1-sigma jitter of +- 150 ps for a 0.5-MV switch at 80% of its self-breakdown voltage using a low-divergence KrF laser. The other scheme uses additives to the normal dielectric gas, such as tripropylamine, which are selected to undergo resonant two-step ionization in the uv laser field.

• Research Organization: Sandia National Laboratories, Albuquerque, New Mexico 87185
• OSTI ID: 5222242
• Journal Information: J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 53:7; ISSN JAPIA
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
420800* -- Engineering-- Electronic Circuits & Devices-- (-1989)
BREAKDOWN
DATA
ELECTRICAL EQUIPMENT
ELECTROMAGNETIC RADIATION
ELECTRONIC CIRCUITS
ELECTRONIC EQUIPMENT
EQUIPMENT
EXPERIMENTAL DATA
FLUORIDES
FLUORINE COMPOUNDS
FUNCTION GENERATORS
HALIDES
HALOGEN COMPOUNDS
HIGH-VOLTAGE PULSE GENERATORS
INFORMATION
IONIZATION
LASER RADIATION
NUMERICAL DATA
ORGANIC COMPOUNDS
PULSE CIRCUITS
PULSE GENERATORS
RADIATION EFFECTS
RADIATIONS
RESONANCE
SPARK GAPS
SULFUR COMPOUNDS
SULFUR FLUORIDES
SWITCHES
TRIGGER CIRCUITS
ULTRAVIOLET RADIATION