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Title: Gas mixtures for gas-filled particle detectors

Patent ·
OSTI ID:5222105

Improved binary and tertiary gas mixtures for gas-filled particle detectors are provided. The components are chosen on the basis of the principle that the first component is one gas or mixture of two gases having a large electron scattering cross section at energies of about 0.5 eV and higher, and the second component is a gas (Ar) having a very small cross section at and below aout 0.5 eV, whereby fast electrons in the gaseous mixture are slowed into the energy range of about 0.5 eV where the cross section for the mixture is small and hence the electron mean free path is large. The reduction in both the cross section and the electron energy results in an increase in the drift velocity of the electrons in the gas mixtures over that for the separate components for a range of E/P (pressure-reduced electron field) values. Several gas mixtures are provided that provide faster response in gas-filled detectors for convenient E/P ranges as compared with conventional gas mixtures.

Assignee:
Dept. of Energy
Patent Number(s):
US 4201692
Application Number:
TRN: 80-014783
OSTI ID:
5222105
Resource Relation:
Patent File Date: Filed date 22 Jan 1979; Other Information: PAT-APPL-5,263
Country of Publication:
United States
Language:
English