Stress modification of Ni--Fe films by ion bombardment concurrent with film growth by alloy evaporation
A technique is described for selectively modifying, by ion bombardment during film growth, the state of internal stress of thin films on flexible polymer substrates. A laser-monitoring system is used to measure strain-induced deflections of the simply supported substrate prior to, during, and after the deposition without disturbing the film--substrate system. Sensitivity of the in situ measured bending force per unit width is approx.130 dyn/cm. The result is a composite view of the ''frozen-in'' thin-film internal stress including postdeposition relaxation. Permalloy (83% Ni--17% Fe) is deposited on Kapton at room temperature by electron beam evaporation simultaneous with Ar/sup +/ bombardment of current densities j = 10 to 1000 ..mu..A/cm/sup 2/ and ion energies E = 150, 300, 750, and 1500 eV/ion. In the absence of ion bombardment, the average internal stress is tensile with a value of 11 Gdyn/cm/sup 2/ for deposition rate = 0.5 nm/s. Transition from tensile to compressive stress is a strong function of j and a rather weak function of E.
- Research Organization:
- Eastman Kodak Company, Rochester, New York 14650
- OSTI ID:
- 5221716
- Journal Information:
- J. Vac. Sci. Technol., A; (United States), Journal Name: J. Vac. Sci. Technol., A; (United States) Vol. 6:3; ISSN JVTAD
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
360106* -- Metals & Alloys-- Radiation Effects
ALLOYS
COATINGS
COLLISIONS
DEPOSITION
EVAPORATION
FILMS
ION COLLISIONS
IRON ALLOYS
NICKEL ALLOYS
NICKEL BASE ALLOYS
PERMALLOY
PHASE TRANSFORMATIONS
PHYSICAL RADIATION EFFECTS
POLYMERS
RADIATION EFFECTS
STRAINS
STRESSES
SURFACE COATING
THIN FILMS
VACUUM COATING
VACUUM EVAPORATION
VAPOR DEPOSITED COATINGS