High efficiency photoemission from Cs{endash}K{endash}Te

Journal Article · Sat Mar 01 04:00:00 EST 1997 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.118362· OSTI ID:520965

Bisero, D; van Oerle, B M ^[1]; Ernst, G J; Verschuur, J W; Witteman, W J ^[2]

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1. NCLR, 7500 CR Enschede (the Netherlands)
2. Department of Applied Physics, University of Twente, 7500 AE Enschede (the Netherlands)

Cs{endash}K{endash}Te films have been fabricated under ultrahigh vacuum by vapor deposition of Te, K, and Cs onto a Mo substrate into the preparation chamber of the free electron laser of the University of Twente. Their photoemission properties are reported in this letter. The average quantum efficiency at 259 nm measured on 5 evaporated Cs{endash}K{endash}Te photocathodes is 22.5{percent}, whereas the best quantum efficiency obtained at 259 nm is 23.4{percent}. To our knowledge, this is the highest quantum efficiency at 259 nm reported so far, being about twice that of Cs{sub 2}Te photocathodes. The reported results demonstrate that Cs{endash}K{endash}Te photocathodes are very promising for the use in photoinjectors. {copyright} {ital 1997 American Institute of Physics.}

• OSTI ID: 520965
• Journal Information: Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 12 Vol. 70; ISSN APPLAB; ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
43 PARTICLE ACCELERATORS
66 PHYSICS
CESIUM ALLOYS
DEPOSITION
FREE ELECTRON LASERS
PHOTOCATHODES
PHOTOEMISSION
POTASSIUM ALLOYS
QUANTUM EFFICIENCY
TELLURIUM ALLOYS
THIN FILMS
VAPOR DEPOSITED COATINGS