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U.S. Department of Energy
Office of Scientific and Technical Information

Process feasibility study in support of silicon material, Task I. Quarterly technical progress report (XVIII), December 1, 1979-February 29, 1980

Technical Report ·
DOI:https://doi.org/10.2172/5198313· OSTI ID:5198313
Analyses of process system properties were continued for important chemical materials involved in the several processes under consideration for semiconductor and solar cell grade silicon production. Major activities were devoted to physical, thermodynamic and transport property data for silicon. Property data are reported for vapor pressure heat of vaporization, heat of sublimation, liquid heat capacity and solid heat capacity as a function of temperature to permit rapid usage in engineering. Chemical engineering analysis of the HSC process (Hemlock Semiconductor Corporation) for production of silicon was initiated. The process is based on hydrogen reduction of dichlorosilane (DCS) to produce the polysilicon. The chemical vapor deposition reaction for DCS is faster in rate than the conventional process route which utilizes trichlorosilane (TCS) as the silicon raw material. Status and progress are reported for primary activities of base case conditions (30%), reaction chemistry (25%) and process flow diagram (20%). Discussions with HSC and construction of a process flow diagram are in progress. Preliminary economic analysis of the BCL process (case B) was completed. Cost analysis results are presented based on a preliminary process design of a plant to produce 1000 metric tons/year of silicon. Fixed capital investment for the plant is $14.35 million (1980 dollars) and product cost without profit is 11.08 $/kg of silicon (1980 dollars). Cost sensitivity analysis indicate that the product cost is influenced most by plant investment and least by labor. For profitability, a sales price of 14 $/kg (1980 dollars) gives a 14% DCF rate of return on investment after taxes.
Research Organization:
Lamar Univ., Beaumont, TX (USA). Dept. of Chemical Engineering
DOE Contract Number:
NAS-7-100-954343
OSTI ID:
5198313
Report Number(s):
DOE/JPL/954343-80/18
Country of Publication:
United States
Language:
English