Intrinsic-damage-threshold study. Final report for the period ending November 15, 1979
Conference
·
OSTI ID:5182015
We have prepared bare fused silica surfaces by subjecting the mechanically polished surface to a rastered cw CO/sub 2/ laser beam. Analysis shows that this processing causes: (1) removal of a uniform layer of fused silica; and (2) a probable re-fusing or healing of existing subsurface fractures. The fused silica removal rate is found to be a function of the laser intensity and scan rate. These surfaces are seen to have very low scatter and to be very smooth. In addition, they have exhibited entrance surface damage thresholds at 1.06 ..mu..m and 1 nsec, which are substantially above those seen on the mechanically polished surface. When damage does occur, it tends to be at a few isolated points rather than the general uniform damage seen on the mechanically polished part. In addition to the damage results, we will discuss an observational technique used for viewing these surfaces which employs dark-field illumination.
- Research Organization:
- Naval Weapons Center, China Lake, CA (USA)
- DOE Contract Number:
- AI08-79DP40097
- OSTI ID:
- 5182015
- Report Number(s):
- DOE/DP/40097-1; CONF-7910101-4; ON: DE82016278
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
70 PLASMA PHYSICS AND FUSION TECHNOLOGY
700208* -- Fusion Power Plant Technology-- Inertial Confinement Technology
CARBON DIOXIDE LASERS
CHALCOGENIDES
GAS LASERS
LASERS
OPTICAL SYSTEMS
OXIDES
OXYGEN COMPOUNDS
PHYSICAL RADIATION EFFECTS
POLISHING
RADIATION EFFECTS
SILICON COMPOUNDS
SILICON OXIDES
SURFACE FINISHING
700208* -- Fusion Power Plant Technology-- Inertial Confinement Technology
CARBON DIOXIDE LASERS
CHALCOGENIDES
GAS LASERS
LASERS
OPTICAL SYSTEMS
OXIDES
OXYGEN COMPOUNDS
PHYSICAL RADIATION EFFECTS
POLISHING
RADIATION EFFECTS
SILICON COMPOUNDS
SILICON OXIDES
SURFACE FINISHING