Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Plasma production from ultraviolet-transmitting targets using subpicosecond ultraviolet radiation

Journal Article · · Optics Letters; (United States)
OSTI ID:5176631
 [1]; ;  [2];  [3]; ; ; ;  [4]
  1. F. M. Technologies, Fairfax, Virginia (USA)
  2. Naval Research Laboratory, Washington, D.C. (USA)
  3. Lawrence Livermore National Laboratory, Livermore, California (USA)
  4. University of Illinois at Chicago, P.O. Box 4348, Chicago, Illinois (USA)
Plasma produced from ultraviolet-transmitting solid targets undergoing intense (10{sup 16} W/cm{sup 2}) subpicosecond ({similar to}600 fs) ultraviolet (248 nm) irradiation have been studied under conditions for which no interfering prepulse plasma is generated. Time and spatially integrated measurements of the x-ray emission for H-like and He-like Mg and Si were found to be consistent with LASNEX calculations that model the laser--target interaction.
DOE Contract Number:
W-7405-ENG-48
OSTI ID:
5176631
Journal Information:
Optics Letters; (United States), Journal Name: Optics Letters; (United States) Vol. 16:16; ISSN 0146-9592; ISSN OPLED
Country of Publication:
United States
Language:
English