Narrow linewidth gain measurements in KrF and ArF excimer amplifiers pumped longitudinally by high-power electrons
- Sandia National Laboratories, Albuquerque, New Mexico (USA)
Single-pulse KrF and ArF gain measurements have been conducted with an excimer amplifier longitudinally pumped by a high-power ({similar to}5-MW/cm{sup 3} deposition) electron beam. This amplifier has preserved the narrow linewidth ({similar to}10 GHz) exhibited by the probe laser beam generated by a grating-tuned, discharge pumped excimer laser. Single-pass gain was measured at 248.45 nm, the peak of the KrF laser gain profile, for a laser pulse with full width half maximum (FWHM) of 20 ns. Analysis of the gain data by a modified Rigrod steady-state formulation yielded values for the small-signal gain, the nonsaturable absorption, and saturation intensity of {ital g}{sub 0} = 12.6%/cm, {alpha}{similar to}0.45%/cm, and {ital I}{sub {ital s}} = 4.1 MW/cm{sup 2}, respectively, for a 750-Torr laser mix. The corresponding gain peak measurement for an ArF beam at 193.31 nm with FWHM of 15 ns produced {ital g}{sub 0} = 12.1%/cm, {alpha}{similar to}0.70%/cm, and {ital I}{sub {ital s}} = 6.7 MW/cm{sup 2} for a 963-Torr laser mix with the same stopping power as the KrF mix. Measurement of gain at 193.68 nm, well away from gain peak, resulted in {ital g}{sub 0}= 10.8%/cm, {alpha}{similar to}0.70%/cm, and {ital I}{sub {ital s}} = 7.9 MW/cm{sup 2} for the same ArF mixture. Several amplified spontaneous emission and oscillator measurements have also been performed. Indications of laser gain saturation at high-power electron-beam deposition have been deduced.
- DOE Contract Number:
- AC04-76DP00789
- OSTI ID:
- 5167262
- Journal Information:
- Journal of Applied Physics; (United States), Vol. 70:8; ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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EXCIMER LASERS
GAIN
AMPLIFIERS
ARGON FLUORIDES
ELECTRON BEAM PUMPING
KRYPTON FLUORIDES
LINE WIDTHS
STOPPING POWER
ULTRAVIOLET RADIATION
AMPLIFICATION
ARGON COMPOUNDS
ELECTRICAL PUMPING
ELECTROMAGNETIC RADIATION
ELECTRONIC EQUIPMENT
EQUIPMENT
FLUORIDES
FLUORINE COMPOUNDS
GAS LASERS
HALIDES
HALOGEN COMPOUNDS
KRYPTON COMPOUNDS
LASERS
PUMPING
RADIATIONS
RARE GAS COMPOUNDS
426002* - Engineering- Lasers & Masers- (1990-)