Characterization of plasma-enhanced CVD processes
Conference
·
OSTI ID:5160260
- North Carolina State University, Raleigh, NC (US)
- AT and T Bell Laboratories, Murray Hill, NJ (US)
- Univ. of California, Berkeley, CA (US)
These proceedings are a refereed collection of the invited and contributed papers presented at the symposium of Characterization of Plasma Enhanced CVD Processes held in Boston, Massachusetts on November 27-28, 1989. The symposium was organized into four sessions: I Diagnostics and Modelling; II PECVD of Silicon Oxides and Nitrides; III Semiconductors; and IV Novel Materials/Applications. There were 12 invited papers, and 24 contributed papers. Thirty-one (31) of these are published in these proceedings.
- OSTI ID:
- 5160260
- Report Number(s):
- CONF-891119--; ISBN: 1-55899-053-4
- Country of Publication:
- United States
- Language:
- English
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