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Adhesion of PVD intermediate layers in solid state bonding applications. Final report

Technical Report ·
OSTI ID:5146444
The conditions prevailing during the deposition of thick metallic films by the hot-hollow cathode method were investigated. The spacial distribution of temperature, surface roughness, and depth of etch during the pre-deposition etching cycle was investigated for two different sample holder designs. The influence of substrate temperature and the angle of incidence of the vapor on the structure and adhesion of thick silver films to type 304 stainless steel was determined. The nature and strength of adhesion were evaluated on the basis of microscopic examinations and tensile test determinations. Similar evaluations were made on tensile test samples formed through electroplating copper and nickel onto the silver films instead of the joining of two silver-coated samples hot-isostatic pressing.
Research Organization:
California Univ., Davis (USA). Div. of Materials Science and Engineering
DOE Contract Number:
W-7405-ENG-48
OSTI ID:
5146444
Report Number(s):
UCRL-15841; ON: DE87001305
Country of Publication:
United States
Language:
English