Diode laser kinetic studies of radical reactions. 1. Reaction of CF sub 3 radicals with NO sub 2

Journal Article · Wed Mar 08 23:00:00 EST 1989 · Journal of Physical Chemistry; (USA)

DOI:https://doi.org/10.1021/j100342a039· OSTI ID:5116927

Sugawara, Koichi; Nakanaga, Taisuke; Takeo, Harutoshi; Matsumura, Chi ^[1]

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1. National Chemical Lab. for Industry, Ibaraki (Japan)

The reaction of CF{sub 3} radicals with NO{sub 2} has been studied over the pressure range 4-20 Torr at 300 K. CF{sub 3} radicals we produced by infrared multiphoton dissociation of CF{sub 3}I. The subsequent decay of the radicals was monitored by using time-resolved diode laser spectroscopy. Analysis of the decay rates gave an absolute rate constant of (2.5 {plus minus} 0.3) {times} 10{sup {minus}11} cm{sup 3} molecule{sup {minus}1}s{sup {minus}1} (3{sigma}). Further, formation of FNO and CF{sub 2}O was observed concomitant with the decay of CF{sub 3}, indicating that the reaction of CF{sub 3} with NO{sub 2} produces FNO and CF{sub 2}O.

• OSTI ID: 5116927
• Journal Information: Journal of Physical Chemistry; (USA), Journal Name: Journal of Physical Chemistry; (USA) Vol. 93:5; ISSN 0022-3654; ISSN JPCHA
• Country of Publication: United States
• Language: English

Related Subjects

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
400201* -- Chemical & Physicochemical Properties
400500 -- Photochemistry
CHALCOGENIDES
CHEMICAL REACTIONS
DATA
DECOMPOSITION
EXPERIMENTAL DATA
FLUORINATED ALIPHATIC HYDROCARBONS
FLUOROFORM
HALOGENATED ALIPHATIC HYDROCARBONS
INFORMATION
LASERS
LOW PRESSURE
MEDIUM TEMPERATURE
MULTI-PHOTON PROCESSES
NITROGEN COMPOUNDS
NITROGEN DIOXIDE
NITROGEN OXIDES
NUMERICAL DATA
ORGANIC COMPOUNDS
ORGANIC FLUORINE COMPOUNDS
ORGANIC HALOGEN COMPOUNDS
OXIDES
OXYGEN COMPOUNDS
PHOTOCHEMICAL REACTIONS
PHOTOLYSIS
PRESSURE DEPENDENCE
RADICALS
SEMICONDUCTOR DEVICES
SEMICONDUCTOR LASERS
SOLID STATE LASERS