Electroless copper films deposited onto laser-activated aluminum nitride and alumina
- Department of Materials Science and Engineering, University of Tennessee, Knoxville, Tennessee 37996-2200 (United States)
- Department of Materials Science and Engineering, University of Tennessee, Knoxville, Tennessee 37996-2200 (United States) Solid State Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831-6056 (United States)
Metallization of ceramic substrates by laser activation and subsequent electroless deposition has been demonstrated recently in aluminum nitride and alumina. However, the bond strength between the electroless copper and the ceramic substrate is weak (less than 14 MPa). Low temperature annealing of electroless copper films deposited on substrates activated at low laser energies strongly increases the adhesion strength. The effectiveness of the annealing for improving the metal-ceramic bonding is dependent upon the laser treatment performed on the substrate prior to deposition. Faster deposition kinetics are obtained for both substrates by increasing the laser energy density. On the other hand, an increase in the laser energy density leads to poor adhesion strengths. The dislocation microstructure produced during laser irradiation in aluminum nitride is analyzed as a possible cause of laser activation. Free aluminum produced by laser irradiation of aluminum nitride and of alumina is discussed as another factor of laser activation. The chemical and microstructural changes taking place in the near-surface region as a consequence of laser-induced processes are correlated with adhesion enhancement promoted by the annealing treatment.
- OSTI ID:
- 5115637
- Journal Information:
- Journal of Materials Research; (United States), Vol. 9:4; ISSN 0884-2914
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
ALUMINIUM NITRIDES
SURFACE COATING
ALUMINIUM OXIDES
COPPER
DEPOSITION
ADHESION
ANNEALING
CHEMICAL ACTIVATION
FILMS
LASER RADIATION
MICROSTRUCTURE
ALUMINIUM COMPOUNDS
CHALCOGENIDES
ELECTROMAGNETIC RADIATION
ELEMENTS
HEAT TREATMENTS
METALS
NITRIDES
NITROGEN COMPOUNDS
OXIDES
OXYGEN COMPOUNDS
PNICTIDES
RADIATIONS
TRANSITION ELEMENTS
360200* - Ceramics
Cermets
& Refractories
360101 - Metals & Alloys- Preparation & Fabrication