Reactive ion beam etching: Dissociation of molecular ions upon impact
Journal Article
·
· J. Vac. Sci. Technol., B; (United States)
This paper reports on etch yield measurements on Au films by ion beams generated from Ar, Ne, O/sub 2/, N/sub 2/, CF/sub 4/, and C/sub 2/F/sub 6/ in a Kaufman-type ion gun for ion energies between 0.2 and 1.4 keV. Ions and neutral species emanating from the gun are characterized by mass spectrometry. For CF/sub 4/ and C/sub 2/F/sub 6/ the ion composition is a strong function of the magnetic field in the gun, CF/sup +//sub 3/ being the major ion only for CF/sub 4/ at low magnetic field. The physical etch yield of CF/sup +//sub 3/ is found to be close to that of Ne/sup +/, not Ar/sup +/. The results on the dependence of the etch yields on ion mass, ion energy, and incident angle can be correlated quantitatively by assuming complete dissociation of molecular ions upon impact on the substrate. The same model is also shown to explain the data by Tachi et al. on etching Si by mass-selected ions of the form CF/sup +//sub x/ and BF/sup +//sub x/. The implications of these results for plasma and reactive ion etching are discussed.
- Research Organization:
- RCA Laboratories Ltd., Badenerstrasse 569, CH-8048 Zuerich, Switzerland
- OSTI ID:
- 5093718
- Journal Information:
- J. Vac. Sci. Technol., B; (United States), Journal Name: J. Vac. Sci. Technol., B; (United States) Vol. 2:1; ISSN JVTBD
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
640301* -- Atomic
Molecular & Chemical Physics-- Beams & their Reactions
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
ARGON
BEAMS
CARBON COMPOUNDS
CARBON FLUORIDES
CHARGED PARTICLES
CHEMICAL REACTION YIELD
COLLISIONS
DATA
DISSOCIATION
ELEMENTS
ENERGY RANGE
ETCHING
EV RANGE
EV RANGE 100-1000
EXPERIMENTAL DATA
FILMS
FLUIDS
FLUORIDES
FLUORINE COMPOUNDS
GASES
GOLD
HALIDES
HALOGEN COMPOUNDS
INFORMATION
ION BEAMS
ION COLLISIONS
ION SOURCES
IONS
KEV RANGE
KEV RANGE 01-10
MAGNETIC FIELDS
MASS SPECTRA
METALS
MOLECULAR IONS
NEON
NONMETALS
NUMERICAL DATA
OXYGEN
RARE GASES
SPECTRA
SURFACE FINISHING
THIN FILMS
TRANSITION ELEMENTS
YIELDS
Molecular & Chemical Physics-- Beams & their Reactions
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
ARGON
BEAMS
CARBON COMPOUNDS
CARBON FLUORIDES
CHARGED PARTICLES
CHEMICAL REACTION YIELD
COLLISIONS
DATA
DISSOCIATION
ELEMENTS
ENERGY RANGE
ETCHING
EV RANGE
EV RANGE 100-1000
EXPERIMENTAL DATA
FILMS
FLUIDS
FLUORIDES
FLUORINE COMPOUNDS
GASES
GOLD
HALIDES
HALOGEN COMPOUNDS
INFORMATION
ION BEAMS
ION COLLISIONS
ION SOURCES
IONS
KEV RANGE
KEV RANGE 01-10
MAGNETIC FIELDS
MASS SPECTRA
METALS
MOLECULAR IONS
NEON
NONMETALS
NUMERICAL DATA
OXYGEN
RARE GASES
SPECTRA
SURFACE FINISHING
THIN FILMS
TRANSITION ELEMENTS
YIELDS