Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Ge-Sn barrier Josephson tunnel junctions

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.90112· OSTI ID:5093669
A new form of superconducting Josephson tunnel junction has been developed in which superconducting electrons tunnel through thick (approx.600 A) barriers formed by evaporated Ge-Sn mixtures. By varying barrier composition and thickness a wide range of junction I-V characteristics can be obtained. For thick barriers, or barriers with low Sn content, high tunneling resistances and no supercurrent result. Barriers of intermediate thickness or with moderate Sn content yield junctions with electrical properties very similar to conventional hysteretic oxide-barrier junctions. Thin, or high Sn content barriers, give junctions with nonhysteretic I-V characteristics similar to those expected for an ideal superconducting microbridge. The nonhysteretic junctions could be used in nonlatching Josephson logic circuits. In addition, the nonhysteretic junctions show excellent microwave response, and may be useful for millimeter-wave mixing and detection.
Research Organization:
Bell Telephone Laboratories, Holmdel, New Jersey 07733
OSTI ID:
5093669
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 32:9; ISSN APPLA
Country of Publication:
United States
Language:
English

Similar Records

Josephson tunneling through Ge-Sn barriers
Conference · Sat Dec 31 23:00:00 EST 1977 · AIP Conf. Proc.; (United States) · OSTI ID:5256236

Tunneling characteristics of internal Josephson junctions in YBa/sub 2/Cu/sub 3/O/sub 7-//sub delta/ thin films
Journal Article · Wed Nov 30 23:00:00 EST 1988 · Phys. Rev. B: Condens. Matter; (United States) · OSTI ID:6889695

Anodized niobium as barrier for Josephson tunnel junctions
Journal Article · Wed Jul 15 00:00:00 EDT 1987 · J. Appl. Phys.; (United States) · OSTI ID:6487741