Pinellas plant ion accelerator facility: an apparatus for low-energy ion scattering and nuclear reaction analysis
The General Electric Neutron Devices Department (GEND) Ion Accelerator Facility first came to being in the Chemistry Laboratory of the Department of Energy (DOE) Pinellas Plant in 1975, with the installation of an Accelerator Inc. Model 200 HP Ion Implanter. The machine was originally used for ion implantation work; and since the machine's relocation in 1979 from the main plant building, the facility has been heavily involved in target assessment and material analysis work. An ultrahigh vacuum beam line has recently been added and the present facility represents a unique combination of accelerator and vacuum technology for broad application in low energy nuclear, solid-state and atomic physics, and material science. First, the general design and performance characteristics of the system are discussed. Some general results of typical applications are presented followed by some plans for future applications.
- Research Organization:
- General Electric Co., St. Petersburg, FL (USA). Neutron Devices Dept.
- DOE Contract Number:
- AC04-76DP00656
- OSTI ID:
- 5084498
- Report Number(s):
- GEPP-OP-741; CONF-8304234-1; ON: DE86001666
- Resource Relation:
- Conference: American Vacuum Society Florida Chapter meeting, St. Petersburg, FL, USA, 19 Apr 1983; Other Information: Portions of this document are illegible in microfiche products
- Country of Publication:
- United States
- Language:
- English
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