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Identification of As/sub Ga/ antisites in plastically deformed GaAs

Journal Article · · J. Appl. Phys.; (United States)
DOI:https://doi.org/10.1063/1.331577· OSTI ID:5078028
As/sub Ga/ antisite defects formed during plastic deformation of GaAs are identified by electron paramagnetic resonance (EPR) measurements. From photo-EPR results it can be concluded that the two levels of this double donor are located near E/sub c/ -0.75 eV and E/sub v/ +0.5 eV. These values are coincident with the Fermi level pinning energies at Schottky barriers. The upper level can be related to the ''main electron trap'' EL2 in GaAs. Photoluminescence experiments before and after thermal annealing suggest that As/sub Ga/ defects reduce the near band edge luminescence efficiency. A dislocation climb model is presented which is able to explain As/sub Ga/ formation during dislocation movement. The production of As/sub Ga/ antisites during dislocation motion under injection conditions in light emitting devices may thus be connected with degradation of the light output.
Research Organization:
II. Physikalisches Institut, Universitaet zu Koeln, D 5000 Koeln 41, West Germany
OSTI ID:
5078028
Journal Information:
J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 53:9; ISSN JAPIA
Country of Publication:
United States
Language:
English