Synthesis and properties of novel ruthenium thin-film materials: Self-assembled multilayer approaches
- Los Alamos National Laboratory, NM (United States)
The synthesis and characterization of stable ruthenium thin films via low-temperature, aqueous solution techniques where self-assembled monolayers are employed to enhance adhesion are described. A monolayer of N-[3-(trimethoxysilyl)propyl]ethylenediaminetriacetate (TMPEDTA) was first introduced onto the surface of fused-silica by a self-assembling scheme followed by nonelectrolytic deposition of a ruthenium thin film using Ru(H[sub 2]O)[sub 6][sup 2+]. The metallic Ru thin films have been characterized by Rutherford backscattering (RBS), electron microprobe analysis (EMPA), scanning electron microscopy (SEM), and scanning tunneling microscopy (STM). RBS suggests a typical thickness of 1500 [angstrom] for these Ru mirror samples, and STM indicates that surface morphology has 10-25-nm structural domains. In addition, X-ray photoelectron spectroscopy (XPS), secondary ions mass spectroscopy (SIMS), and Auger photoelectron spectroscopy (AES) were carried out to elucidate the chemical compositions of these Ru mirror thin films. XPS, SIMS, and AES indicate that the Ru mirror films mainly contain ruthenium metal with 10-20% concentration of oxygen as the sub-oxide RuO. 23 refs., 8 figs.
- OSTI ID:
- 5055076
- Journal Information:
- Chemistry of Materials; (United States), Vol. 4:5; ISSN 0897-4756
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
RUTHENIUM
STRUCTURAL CHEMICAL ANALYSIS
THIN FILMS
AUGER ELECTRON SPECTROSCOPY
CHEMICAL PREPARATION
ION MICROPROBE ANALYSIS
MASS SPECTROSCOPY
PHOTOELECTRON SPECTROSCOPY
X-RAY SPECTROSCOPY
CHEMICAL ANALYSIS
ELECTRON SPECTROSCOPY
ELEMENTS
FILMS
METALS
MICROANALYSIS
NONDESTRUCTIVE ANALYSIS
PLATINUM METALS
SPECTROSCOPY
SYNTHESIS
TRANSITION ELEMENTS
360102* - Metals & Alloys- Structure & Phase Studies
360101 - Metals & Alloys- Preparation & Fabrication