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Phase transformation kinetics in thin films

Conference ·
OSTI ID:5049830
 [1];  [2];  [3];  [4]
  1. IBM Research Div., San Jose, CA (United States). Almaden Research Center
  2. Cornell Univ., Ithaca, NY (United States)
  3. Los Alamos National Lab., NM (United States)
  4. Stevens Inst. of Tech., Hoboken, NJ (United States)

This book contains papers presented at the materials Research Society Symposium on Phase Transformations Kinetics in Thin Films held in Anaheim, California from April 29 through May 1, 1991. This symposium provided a multidisciplinary forum for explorations, on experimental and theoretical levels, of thin film reactions and stability, phase nucleation and growth, and amorphization. The papers in this volume, refereed by the peer review process, are organized according to materials and techniques and do not reflect the order of presentations at the symposium. Symposium sessions were organized in the areas of thin-film crystallization, solid-state amorphization, interfacial reactions, solid-state transformations, phase-change optical media and ferroelectric thin films. Contributed papers ranged from theoretical determination of the limits to melt nucleation to commercial concerns of processing techniques for specific properties. Despite this breadth, the similarity of experimental techniques and thermodynamic underpinnings for most of the materials provided a common basis for discussions.

OSTI ID:
5049830
Report Number(s):
CONF-910406--; ISBN: 1-58899-124-7
Country of Publication:
United States
Language:
English