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Title: Signal formation in a-Si:H particle detectors

Journal Article · · IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States)
DOI:https://doi.org/10.1109/23.289305· OSTI ID:5039301
;  [1];  [2];  [3]
  1. Montreal Univ., PQ (Canada). Lab. de Physique Nucleaire
  2. Thomson and Nielsen Electronics Ltd., Ottawa (CA)
  3. Lab. de Physique de Interfacs et des Couches Minces, UPR258 CNRS, Ecole Polytechnique, 91128 Palaiseau (FR)

This paper presents the response of an hydrogenated amorphous silicon thin film p-i-n diode to protons as a function of the applied bias. A typical pulse shape is also presented. These data are understood on the basis of a model whose main features are fast ({lt}5 nsec) electron collection and slow (few {mu}sec) hole collection due to multiple trapping transport through the shallow gap states. The overall charge normalization yields a means pair creation energy {epsilon}p of 3.4 - .4 eV, comparable to 3.63 eV in crystalline Silicon despite the large 1.7 eV gap. To understand this result, a microscopic Monte Carlo calculation, taking into account the actual density of states in a-Si:H, is used to study the energy sharing between ionization and phonon production during hot carrier thermalization. This simulation yields a value of 4.3 eV for {epsilon}p.

OSTI ID:
5039301
Journal Information:
IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States), Vol. 38:2; ISSN 0018-9499
Country of Publication:
United States
Language:
English