Interfaces and defects in opto-electronic semiconductor films studies by atomic resolution stem
Conference
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OSTI ID:503476
- and others
The growth of thin films on dissimilar substrates is of great technological importance for modern optoelectronic devices. However, device applications are currently limited by lattice mismatches between the film and substrate that invariably lead to defects detrimental to device performance. It is therefore of key importance that the mechanisms leading to the formation of these defects are understood on the fundamental atomic level. Correlated atomic resolution Z-contrast imaging and EELS in the STEM is a unique methodology by which this information can be obtained. In this paper, the application of this methodology to determine a novel graphoepitaxial growth mechanism for CdTe on (001)Si is demonstrated, and its potential for the study of GaN is discussed.
- Research Organization:
- Oak Ridge National Lab., TN (United States); Illinois Univ., Chicago, IL (United States). Dept. of Physics
- Sponsoring Organization:
- USDOE Office of Energy Research, Washington, DC (United States)
- DOE Contract Number:
- AC05-96OR22464; FG02-96ER45610
- OSTI ID:
- 503476
- Report Number(s):
- CONF-970834--17; ON: DE97005138
- Country of Publication:
- United States
- Language:
- English
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