Heat treatment of cathodic arc deposited amorphous hard carbon films
- and others
Amorphous hard carbon films of varying sp{sup 2}/sp{sup 3} fractions have been deposited on Si using filtered cathodic are deposition with pulsed biasing. The films were heat treated in air up to 550 C. Raman investigation and nanoindentation were performed to study the modification of the films caused by the heat treatment. It was found that films containing a high sp{sup 3} fraction sustain their hardness for temperatures at least up to 400 C, their structure for temperatures up to 500 C, and show a low thickness loss during heat treatment. Films containing at low sp{sup 3} fraction graphitize during the heat treatment, show changes in structure and hardness, and a considerable thickness loss.
- Research Organization:
- Lawrence Berkeley Lab., CA (US); Advanced Light Source (US)
- Sponsoring Organization:
- USDOE Office of Energy Research, Washington, DC (US); Electric Power Research Inst., Palo Alto, CA (US); Department of Defense, Washington, DC (US)
- DOE Contract Number:
- AC03-76SF00098; AC05-96OR22464; AC05-76OR00033
- OSTI ID:
- 503468
- Report Number(s):
- LBNL--40108; LSBL--383; CONF-970488--3; LBNL/ALS--739; ON: DE97007324
- Country of Publication:
- United States
- Language:
- English
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