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Element-specific detection of organosilicon compounds by gas chromatography/atmospheric pressure microwave induced helium plasma spectrometry

Journal Article · · Anal. Chem.; (United States)
DOI:https://doi.org/10.1021/ac00286a014· OSTI ID:5031474
The gas chromatographic, element-specific detection of organosilicon compounds by atmospheric pressure microwave induced helium plasma spectrometry (GC/MIP) is investigated. At plasma temperatures, silicon is continuously removed from the walls of a quartz discharge tube. This results in a high silicon background response and poor experimental repeatability. Alumina and boron nitride are examined as discharge tubes. Background emission spectra are compared for helium plasmas contained within alumina, boron nitride, and quartz discharge tubes. Silicon detection limits, sensitivity, and selectivity are determined at optimized MIP conditions. A 4.5-pg silicon detection limit is obtained. Simultaneous multielement detection and empirical formula determinations are demonstrated for silicon-, carbon-, hydrogen-, and chlorine-containing compounds. 39 references, 6 figures, 4 tables.
Research Organization:
Univ. of Massachusetts, Amherst
DOE Contract Number:
AC02-77EV04320
OSTI ID:
5031474
Journal Information:
Anal. Chem.; (United States), Journal Name: Anal. Chem.; (United States) Vol. 57:9; ISSN ANCHA
Country of Publication:
United States
Language:
English