Element-specific detection of organosilicon compounds by gas chromatography/atmospheric pressure microwave induced helium plasma spectrometry

Journal Article · Thu Aug 01 00:00:00 EDT 1985 · Anal. Chem.; (United States)

DOI:https://doi.org/10.1021/ac00286a014· OSTI ID:5031474

Slatkavitz, K J; Hoey, L D; Uden, P C; Barnes, R M

The gas chromatographic, element-specific detection of organosilicon compounds by atmospheric pressure microwave induced helium plasma spectrometry (GC/MIP) is investigated. At plasma temperatures, silicon is continuously removed from the walls of a quartz discharge tube. This results in a high silicon background response and poor experimental repeatability. Alumina and boron nitride are examined as discharge tubes. Background emission spectra are compared for helium plasmas contained within alumina, boron nitride, and quartz discharge tubes. Silicon detection limits, sensitivity, and selectivity are determined at optimized MIP conditions. A 4.5-pg silicon detection limit is obtained. Simultaneous multielement detection and empirical formula determinations are demonstrated for silicon-, carbon-, hydrogen-, and chlorine-containing compounds. 39 references, 6 figures, 4 tables.

• Research Organization: Univ. of Massachusetts, Amherst
• DOE Contract Number: AC02-77EV04320
• OSTI ID: 5031474
• Journal Information: Anal. Chem.; (United States), Vol. 57:9
• Country of Publication: United States
• Language: English

Related Subjects

37 INORGANIC
ORGANIC
PHYSICAL AND ANALYTICAL CHEMISTRY
ORGANIC SILICON COMPOUNDS
EMISSION SPECTROSCOPY
GAS CHROMATOGRAPHY
EXPERIMENTAL DATA
HELIUM
MICROWAVE TUBES
PLASMA
QUANTITATIVE CHEMICAL ANALYSIS
TRACE AMOUNTS
CHEMICAL ANALYSIS
CHROMATOGRAPHY
DATA
ELECTRON TUBES
ELECTRONIC EQUIPMENT
ELEMENTS
EQUIPMENT
FLUIDS
GASES
INFORMATION
MICROWAVE EQUIPMENT
NONMETALS
NUMERICAL DATA
ORGANIC COMPOUNDS
RARE GASES
SEPARATION PROCESSES
SPECTROSCOPY
400102* - Chemical & Spectral Procedures
400104 - Spectral Procedures- (-1987)