Numerical calculations of impurity profiles and of energy deposited by implantation of ions of medium energy. Comparison with experiment (in French)
Technical Report
·
OSTI ID:4934118
From congress on the centenary of the French Physics Society; Vittel, France (28 May 1973). The paths of heavy ions slowing down in an amorphous material were studied together with the spatial distribution of the damage caused by an incident ion and the associated collision cascade during an ion-implanting process. The Winterbon model was adopted. Results are in good agreement with experimentally measured values. (12 figures) (auth)
- Research Organization:
- CEA Centre d'Etudes Nucleaires de Grenoble, 38 (France). Lab. d'Electronique et de Technologie de l'Informatique
- Sponsoring Organization:
- Sponsor not identified
- NSA Number:
- NSA-29-005561
- OSTI ID:
- 4934118
- Report Number(s):
- CEA-CONF--2372; CONF-730574--1
- Country of Publication:
- France
- Language:
- French
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Related Subjects
AMORPHOUS STATE
ARSENIC IONS
COLLISIONS
DEPTH
ENERGY LOSSES
HEAVY IONS
ION BEAMS
ION IMPLANTATION
KEV RANGE
N50340* --Metals
Ceramics
& Other Materials--Plastics & Other Materials--Radiation Effects
PHOSPHORUS IONS
PHYSICAL RADIATION EFFECTS
SILICON
SILICON OXIDES
SOLIDS
SPATIAL DISTRIBUTION
ARSENIC IONS
COLLISIONS
DEPTH
ENERGY LOSSES
HEAVY IONS
ION BEAMS
ION IMPLANTATION
KEV RANGE
N50340* --Metals
Ceramics
& Other Materials--Plastics & Other Materials--Radiation Effects
PHOSPHORUS IONS
PHYSICAL RADIATION EFFECTS
SILICON
SILICON OXIDES
SOLIDS
SPATIAL DISTRIBUTION