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Title: Pulsed laser deposition of Si nanocluster films

Book ·
OSTI ID:490862

The studies of light emission from Si-related materials have attracted attention in the past several years because of the potential applications for optoelectronic devices. Reactive laser ablation of Si targets by ArF* excimer laser (wavelength 193 nm, pulse width 15 ns (FWHM)) was performed in He, Ar or O{sub 2} 0.05--1 Torr atmospheres and led to Si-SiO{sub x} nanocluster thin film formation within laser-induced plasma plume. Optical spectroscopy and optical Time-of-Flight (TOF) measurements were carried out during ablation-deposition experiments. A number of large weak emission bands in blue and green-yellow spectral branches were observed both in inert gases and in oxygen ambient atmospheres and attributed to the emission from excited nanoparticles in the plasma plume. TOF measurements proved a different spatio-temporal evolution of this emission compare to the emission of monoatomic particles. The films exhibit photoluminescence bands in the UV region (around 290 nm and between 310--370 nm), in the blue (between 240 and 500 nm), and in the green-yellow (at 520--560 nm). The relative intensities of the luminescence bands depend on the average cluster size, which is determined by preparation conditions (nature and pressure of the ambient gas, laser fluence).

OSTI ID:
490862
Report Number(s):
CONF-951155-; ISBN 1-55899-300-2; TRN: IM9729%%113
Resource Relation:
Conference: Fall meeting of the Materials Research Society (MRS), Boston, MA (United States), 27 Nov - 1 Dec 1995; Other Information: PBD: 1996; Related Information: Is Part Of Advanced laser processing of materials -- Fundamentals and applications; Singh, R. [ed.] [Univ. of Florida, Gainesville, FL (United States)]; Norton, D. [ed.] [Oak Ridge National Lab., TN (United States)]; Laude, L. [ed.] [Univ. of Mons-Hainaut, Mons (Belgium)]; Narayan, J. [ed.] [North Carolina State Univ., Raleigh, NC (United States)]; Cheung, J. [ed.] [Rockwell International Science Center, Thousand Oaks, CA (United States)]; PB: 693 p.; Materials Research Society symposium proceedings, Volume 397
Country of Publication:
United States
Language:
English