Real-time monitoring of volatile organic compounds using chemical ionization mass spectroscopy: Final report

Technical Report · Tue Apr 01 04:00:00 EST 1997

DOI:https://doi.org/10.2172/481566· OSTI ID:481566

Thornberg, S M; Mowry, C D; Keenan, M R; Bender, S F.A. ^[1]; Owen, T ^[2]

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1. Sandia National Labs., Albuquerque, NM (United States). Gas Analysis Lab.
2. Intel Corp., Rio Rancho, NM (United States)

Volatile organic compound (VOC) emission to the atmosphere is of great concern to semiconductor manufacturing industries, research laboratories, the public, and regulatory agencies. Some industries are seeking ways to reduce emissions by reducing VOCs at the point of use (or generation). This paper discusses the requirements, design, calibration, and use of a sampling inlet/quadrupole mass spectrometer system for monitoring VOCs in a semiconductor manufacturing production line. The system uses chemical ionization to monitor compounds typically found in the lithography processes used to manufacture semiconductor devices (e.g., acetone, photoresist). The system was designed to be transportable from tool to tool in the production line and to give the operator real-time feedback so the process(es) can be adjusted to minimize VOC emissions. Detection limits ranging from the high ppb range for acetone to the low ppm range fore other lithography chemicals were achieved using chemical ionization mass spectroscopy at a data acquisition rate of approximately 1 mass spectral scan (30 to 200 daltons) per second. A demonstration of exhaust VOC monitoring was performed at a working semiconductor fabrication facility during actual wafer processing.

• Research Organization: Sandia National Labs., Albuquerque, NM (United States)
• Sponsoring Organization: USDOE, Washington, DC (United States)
• DOE Contract Number: AC04-94AL85000
• OSTI ID: 481566
• Report Number(s): SAND--97-0524; ON: DE97006291; CRN: C/SNL--SC9301154E
• Country of Publication: United States
• Language: English

Related Subjects

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