MOLECULAR PLATING: A METHOD FOR THE ELECTROLYTIC FORMATION OF THIN INORGANIC FILMS
A method was developed that may solve the problem of the preparations of thin films suitable for all the many different radioactive materials available for use in nuclear spectroscopy provided the thin film in question is not required as the metal. The most significant difference between the method and ordinary electrodeposition is that electrolytic dissociation does not occur to any comparable degree during the passage of current. Also, the same chemical compound, chloride or nitrate as the case may be, is deposited at the cathode as that originally dissolved in the electrolyte. Thus, the method is called molecular plating. Other differences are the use of high voltages (50-2000 v) and the use of an organic solution. The procedure and the advantages of the method are discussed. (P.C.H.)
- Research Organization:
- Chalmers Univ. of Tech., Gothenburg, Sweden
- NSA Number:
- NSA-17-001451
- OSTI ID:
- 4774927
- Journal Information:
- Nucl. Instr. Methods, Journal Name: Nucl. Instr. Methods Vol. Vol: 16
- Country of Publication:
- Country unknown/Code not available
- Language:
- English
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