FILM FLOW OF LIQUID HELIUM AT LOW-PRESSURE HEADS

Journal Article · Mon Oct 15 04:00:00 EDT 1962 · Physical Review (U.S.) Superseded in part by Phys. Rev. A, Phys. Rev. B: Solid State, Phys. Rev. C, and Phys. Rev. D

DOI:https://doi.org/10.1103/PhysRev.128.502· OSTI ID:4771551

Seki, H

A steady-state method was developed and used to measure the flow rate of saturated liquid-helium films at small pressure heads. In this method a steady heat input into a glass vessel partially immersed in liquid helium generates the film flow inwards. A steady state is established when the rate of film flow is equal to the rate of distillation out of the vessel. The flow rate was derived from the temperature difference and level difference between the liquid in the vessel and the bath. Measurements in the vicinity of 1.2 deg K indicate a marked pressure-head dependence of the flow rate below a pressure head of 0.01 cm of liquid helium. A maximum flow rate for zero pressure head ( plus or minus 0.001 cm of liquid helium) of about 5 x 10/sup -5/ cc/sec cm is observed. This rate is suggested to be the true critical flow rate of the film. (auth)

• Research Organization: Univ. of Pennsylvania, Philadelphia
• NSA Number: NSA-17-000641
• OSTI ID: 4771551
• Journal Information: Physical Review (U.S.) Superseded in part by Phys. Rev. A, Phys. Rev. B: Solid State, Phys. Rev. C, and Phys. Rev. D, Journal Name: Physical Review (U.S.) Superseded in part by Phys. Rev. A, Phys. Rev. B: Solid State, Phys. Rev. C, and Phys. Rev. D Vol. Vol: 128; ISSN PHRVA
• Country of Publication: Country unknown/Code not available
• Language: English

Related Subjects

FILMS
FLUID FLOW
GLASS
HEATING
HELIUM
LIQUIDS
LOW TEMPERATURE
MEASURED VALUES
PHYSICS
PRESSURE
TEMPERATURE
VESSELS