The fluorescence x-ray microprobe at the Advanced Light Source

Conference · Tue Dec 31 04:00:00 EST 1996

OSTI ID:474595

Thompson, A C; Chapman, K ^[1]

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1. Lawrence Berkeley National Lab., CA (United States). Center for X-ray Optics

The fluorescence x-ray microprobe beamline at the Advanced Light Source (ALS) provides a technique to study almost any sample with excellent trace element sensitivity, high spatial resolution and minimal sample damage. During the last two years, the focused spot size has been improved from 2 {micro}m x 4 {micro}m to 1.6 {micro}m x 1 {micro}m using a pair of elliptically-bent multilayer mirrors. Two sets of mirrors have been produced for operation at 8.5 keV and 12.5keV with a bandpass ({Delta}E/E) of 4%. The intensity has also increased by a factor of 20 to over 1 {times} 10{sup 10} photons/sec by linearly grading the multilayer coating on the mirrors and by operation of the ALS at 1.9 GeV rather than 1.5 GeV. A wide variety of samples have been studied. Some of the materials science samples that have been studied include gallium nitride samples, polycrystalline silicon solar cells, the liner material of a rocket motor and the central germanium core of an optical fiber.

• Sponsoring Organization: USDOE, Washington, DC (United States)
• DOE Contract Number: AC03-76SF00098
• OSTI ID: 474595
• Report Number(s): CONF-960401--; ISBN 1-55899-340-1
• Country of Publication: United States
• Language: English

Related Subjects

40 CHEMISTRY
43 PARTICLE ACCELERATORS
ACCELERATOR FACILITIES
ADVANCED LIGHT SOURCE
MICROANALYSIS
OPTICAL SYSTEMS
USES
X-RAY FLUORESCENCE ANALYSIS
X-RAY FLUORESCENCE ANALYZERS