KINETICS OF OXIDATION OF REFRACTORY METALS AND ALLOYS AT 1000 -2000 C

Technical Report · Sun Jul 01 04:00:00 EDT 1962

OSTI ID:4718754

Berkowitz-Mattuck, J B

An apparatus is described for continuous measurement of the rate of oxidation of metallic materials at temperatures between 900 and 2100 un. Concent 85% C. Quantitative results obtained by the technique for the oxidation of Cu between 975 and 1044 un. Concent 85% C at oxygen partial pressures of 2 to 10 mm are in good agreement with previously reported values. For the highest carbides of Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, and W, the results of calculations of the pressures of CO and CO/sub 2/ over an equilibrium mixture of metal carbide and the corresponding metal oxide are given along with maximum temperatures for oxidation resistance. HfC was found to be the most promising refractory carbide. The oxidation of Mo/sub 3/Si, Mo/sub 5/Si/sub 3/, and MoSi/sub 2/ at 1300 to 2100 un. Concent 85% K and oxyg en pressures of 2 to 20 torr was studied by oxygen consumption and metallographic techniques. The oxidation of W/sub 5/Si/sub 3/ and WSi/sub 2/ was studied by the thermal conductivity method at temperatures between 1600 and 2030 un. Concent 85% C. A measurement of the rate of oxygen consumption of Ta/sub 2/Be/sub 17/ was made at 1664 un. Concent 85% K and an oxygen partial pressure of 8.4 torr. (P.C.H.)

• Research Organization: Little (Arthur D.) Inc., Cambridge, Mass.
• NSA Number: NSA-17-021665
• OSTI ID: 4718754
• Report Number(s): ASD-TDR-62-203(Pt.II)
• Country of Publication: United States
• Language: English

Related Subjects

BERYLLIUM ALLOYS
CARBON DIOXIDE
CARBON MONOXIDE
CHEMISTRY
CHROMIUM CARBIDES
COPPER
HAFNIUM CARBIDES
HIGH TEMPERATURE
METALLOGRAPHY
MOLYBDENUM ALLOYS
MOLYBDENUM CARBIDES
NIOBIUM CARBIDES
OXIDATION
OXYGEN
PRESSURE
REACTION KINETICS
SILICIDES
TANTALUM ALLOYS
TANTALUM CARBIDES
TEMPERATURE
THERMAL CONDUCTIVITY
TITANIUM CARBIDES
TUNGSTEN ALLOYS
TUNGSTEN CARBIDES
VANADIUM CARBIDES
ZIRCONIUM CARBIDES