DEPOSITION OF BORON NITRIDE LAYERS ON SILICON SUBSTRATES AND THEIR APPLICATION AS DIFFUSION SOURCES. (in German)
Journal Article
·
· Phys. Status Solidi (a) 8: No. 1, 71-8 (16 Nov 1971).
OSTI ID:4697079
- Research Organization:
- VEB Halbleiterwerk, Frankfurt am Main
- NSA Number:
- NSA-26-012762
- OSTI ID:
- 4697079
- Journal Information:
- Phys. Status Solidi (a) 8: No. 1, 71-8 (16 Nov 1971)., Other Information: Orig. Receipt Date: 31-DEC-72
- Country of Publication:
- Country unknown/Code not available
- Language:
- German
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Related Subjects
N30230* -Metals
Ceramics
& Other Materials-Ceramics & Cermets-Properties Evaluations
BORON
BORON NITRIDES
COATING
DIFFUSION
HEAT TREATMENTS
LAYERS
SUBSTRATES
SURFACES
SILICON/coating with boron nitride for use as diffusion source
BORON/diffusion of
deposition of boron nitride on silicon for studies of
BORON NITRIDES/deposition on silicon substrates for use as diffusion source
spark discharge method for
Ceramics
& Other Materials-Ceramics & Cermets-Properties Evaluations
BORON
BORON NITRIDES
COATING
DIFFUSION
HEAT TREATMENTS
LAYERS
SUBSTRATES
SURFACES
SILICON/coating with boron nitride for use as diffusion source
BORON/diffusion of
deposition of boron nitride on silicon for studies of
BORON NITRIDES/deposition on silicon substrates for use as diffusion source
spark discharge method for