Orientation imaging of a Nb-Ti-Si directionally solidified in-situ composite
- GE Corporate R&D, Schenectady, NY (United States)
In this paper we report on the microstructural characterization of a directionally solidified (DS) Nb-Ti-Si alloy. The solidified ingot had a nominal composition of Nb-33 at%Ti- 16 at% Si and was grown using the Czochralski technique with growth rate of 5 mm/min. The as-solidified ingot was approximately 50 mm long with a 10 mm diameter. The microstructure was examined using backscatter electron imaging and the microtexture of each of the phases was determined using the Electron BackScattering Pattern (EBSP) technique for electron diffraction in the scanning electron microscope. The details of the experiments are similar to those we have reported previously. Automated EBSP scans were acquired in order to map the local texture (microtexture) over most of a transverse cross-section through the ingot.
- OSTI ID:
- 468826
- Report Number(s):
- CONF-960877--
- Country of Publication:
- United States
- Language:
- English
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