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Title: Characterization of interface states in thin epitaxial film In{sub 0.75}Ga{sub 0.25}P/Ag diodes

Journal Article · · AIP Conference Proceedings
DOI:https://doi.org/10.1063/1.51129· OSTI ID:451094
 [1]; ;  [2]
  1. Laboratorio de Semiconductores, Departamento de Fisica, Universidad de Oriente, Apartado 188, Cumana 6101, Sucre (Venezuela)
  2. Ecole Polytechnic de Montreal, Departement de genie Physique, P.O. Box 6079, Station A, Montreal, Quebec (Canada)

Epitaxial In{sub 0.75}Ga{sub 0.25}P/Ag Schottky contacts were fabricated by electron beam evaporation of Ag on an epitaxial thin film of In{sub 0.75}Ga{sub 0.25}P grown on highly doped n-InP substrate by MOCVD. The diode showed non-ideal behavior with an ideality factor of 1.3 and is thought to have a metal-interface layer-semiconductor (MIS) structure. The room temperature small signal ac capacitance ({ital C}{sub {ital m}}) was measured as a function of applied voltage (V{sub {ital a}}), in the frequency ({ital f}) range 0.5 KHz and 1 MHz. Under forward bias, the large frequency dispersion in {ital C}{sub {ital m}} was attributed to the interface states in equilibrium with the semiconductor (In{sub 0.75}Ga{sub 0.25}P). From {ital C}{sub {ital m}}, the interface states capacitance {ital C}{sub {ital p}} was extracted. The experimental {ital C}{sub {ital p}}{minus}{ital f} data fitted well to Lehovec{close_quote}s model of an interface state continuum with a single time constant and provided the values of the interface states energy density ({ital N}{sub {ital ss}}), relaxation time ({tau}) and capture cross-section ({sigma}{sub {ital n}}) for forward bias (V{sub {ital a}}) voltages between 0.0 V and 0.4 V. Over the forward bias range 0.4V{gt}V{sub {ital a}}{gt}0.0V,{ital N}{sub {ital ss}} decreased linearly with bias from 1.7{times}10{sup 12} eV{sup {minus}1}cm{sup {minus}2} to 2.4{times}10{sup 11} eV{sup {minus}1}cm{sup {minus}2} and {sigma}{sub {ital n}} increased exponentially with bias from 1.9{times}10{sup {minus}15} cm{sup 2} to 3.9{times}10{sup {minus}9} cm{sup 2}. {copyright} {ital 1996 American Institute of Physics.}

OSTI ID:
451094
Report Number(s):
CONF-9409431-; ISSN 0094-243X; TRN: 9703M0098
Journal Information:
AIP Conference Proceedings, Vol. 378, Issue 1; Conference: Surfaces, vacuum and their applications, Cancun (Mexico), 19-23 Sep 1994; Other Information: PBD: Jul 1996
Country of Publication:
United States
Language:
English

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