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Title: An x-ray photoelectron spectroscopy investigation of O impurity chemistry in CdS thin films grown by chemical bath deposition

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.364054· OSTI ID:450263
; ;  [1]
  1. National Renewable Energy Laboratory, 1617 Cole Boulevard, Golden, Colorado 80401 (United States)

We used x-ray photoelectron spectroscopy to investigate the chemistry of O impurity atoms in CdS thin films grown for photovoltaic purposes by chemical-bath deposition (CBD). We compared the Cd 3d photoline, O 1s photoline, Cd MNN Auger line, and O KLL Auger line taken from a CBD CdS thin film, CdS single-crystal reference, Cd metal reference, CdO reference, and Cd(OH){sub 2} reference. This comparison showed that the O present in thin-film CBD CdS is a manifestation of H{sub 2}O incorporated into the film during the CBD growth. Ar{sup +} ion sputtering, a technique frequently used in thin-film analyses, preferentially removed S from the CBD CdS thin film and created CdS{sub 1{minus}x}O{sub x} ({ital x}{approximately}0.04) in the surface region from the incorporated O impurity. {copyright} {ital 1997 American Institute of Physics.}

OSTI ID:
450263
Journal Information:
Journal of Applied Physics, Vol. 81, Issue 4; Other Information: PBD: Feb 1997
Country of Publication:
United States
Language:
English